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Chemical vapor deposition system
This is a microwave plasma enhanced chemical vapor deposition system mainly used for super hard material (e.g. diamond) and carbon nanomaterial (e.g. carbon nanotubes) growth. Different gas sources can be input, such as H2, C2H2, CH4, etc. The substrate temperature can be controlled from 500-1000oC. A bias can be applied during deposition.
DEPARTMENT OF PHYSICS